Invention Grant
- Patent Title: Dopant for improving casting and electroplating performance
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Application No.: US17462273Application Date: 2021-08-31
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Publication No.: US11806964B2Publication Date: 2023-11-07
- Inventor: Barbara Diane Young , Steven James Sedlock
- Applicant: Honeywell Federal Manufacturing & Technologies, LLC
- Applicant Address: US MO Kansas City
- Assignee: Honeywell Federal Manufacturing & Technologies, LLC
- Current Assignee: Honeywell Federal Manufacturing & Technologies, LLC
- Current Assignee Address: US MO Kansas City
- Agency: Erise IP, P.A.
- Main IPC: B32B15/01
- IPC: B32B15/01 ; C25D3/44 ; C25D3/38 ; C25D7/12

Abstract:
Systems, methods, components, and parts are provided for improving casting and electroplating performance of a plated cast part by doping a semiconductor material with an electrically active dopant before mixing the semiconductor material into a base material. The doped semiconductor material improves the castability of the base material and has an improved electrical conductivity which is closer to that of the base material such that a consistency of a subsequent plating on the part is improved.
Public/Granted literature
- US20230063553A1 DOPANT FOR IMPROVING CASTING AND ELECTROPLATING PERFORMANCE Public/Granted day:2023-03-02
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