Invention Grant
- Patent Title: Exhaust device, processing system, and processing method
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Application No.: US16775439Application Date: 2020-01-29
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Publication No.: US11807938B2Publication Date: 2023-11-07
- Inventor: Yutaka Motoyama , Rui Kanemura
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Venjuris, P.C.
- Priority: JP 19018227 2019.02.04
- Main IPC: C23C16/44
- IPC: C23C16/44 ; C23C16/455 ; C23C16/52
Abstract:
An exhaust device includes: a first pressure regulator provided in an exhaust pipe connected to a processing container; a second pressure regulator provided on a downstream side of the first pressure regulator; a first vacuum gauge provided on an upstream side of the first pressure regulator; and a second vacuum gauge provided between the first pressure regulator and the second pressure regulator.
Public/Granted literature
- US20200248305A1 EXHAUST DEVICE, PROCESSING SYSTEM, AND PROCESSING METHOD Public/Granted day:2020-08-06
Information query
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