Invention Grant
- Patent Title: Microlens array device used to project at least two patterns for improving control of projecting light
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Application No.: US17080864Application Date: 2020-10-27
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Publication No.: US11808953B2Publication Date: 2023-11-07
- Inventor: Yu-Ching Cheng
- Applicant: HIMAX TECHNOLOGIES LIMITED
- Applicant Address: TW Tainan
- Assignee: HIMAX TECHNOLOGIES LIMITED
- Current Assignee: HIMAX TECHNOLOGIES LIMITED
- Current Assignee Address: TW Tainan
- Agent Winston Hsu
- Main IPC: G02B3/00
- IPC: G02B3/00 ; G02B1/11 ; G02B3/04 ; G01S7/481

Abstract:
A microlens array device includes a substrate and a microlens array. The microlens array is disposed on the substrate and includes a plurality of first lenses and a plurality of second lenses. Each of the first lenses is used to project a first pattern on a far field. Each of the second lenses is used to project a second pattern on the far field. The first pattern has a first area on the far field. The second pattern has a second area on the far field. The first area is different from the second area. One of the two patterns is completely overlapped on the other one of the two patterns.
Public/Granted literature
- US20220128741A1 MICROLENS ARRAY DEVICE USED TO PROJECT AT LEAST TWO PATTERNS FOR IMPROVING CONTROL OF PROJECTING LIGHT Public/Granted day:2022-04-28
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