Invention Grant
- Patent Title: Control device, lithography apparatus, measurement apparatus, processing apparatus, planarizing apparatus, and article manufacturing method
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Application No.: US17820040Application Date: 2022-08-16
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Publication No.: US11809089B2Publication Date: 2023-11-07
- Inventor: Tosiya Asano , Kota Nakano
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. IP Division
- Priority: JP 17196419 2017.10.06 JP 18131013 2018.07.10
- Main IPC: G05B13/00
- IPC: G05B13/00 ; G03F7/00 ; G05B13/02

Abstract:
A feedback control device that takes information regarding a control deviation between a measured value and a desired value of a controlled object as input, and outputs a manipulated variable for the controlled object, includes: a first control unit that takes information regarding the control deviation as input, and outputs a manipulated variable for the controlled object; a second control unit that takes information regarding the control deviation as input, and that includes a learning control unit in which a parameter for outputting a manipulated variable for the controlled object is determined by machine learning; and an adder that adds a first manipulated variable output from the first control unit and a second manipulated variable output from the second control unit. A manipulated variable from the adder is output to the controlled object, and the second control unit includes a limiter that limits the second manipulated variable.
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