Invention Grant
- Patent Title: Computed axial lithography optimization system
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Application No.: US16927469Application Date: 2020-07-13
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Publication No.: US11809161B2Publication Date: 2023-11-07
- Inventor: Maxim Shusteff , Kyle Champley , Erika Jo Fong , Hayden Taylor , Chi Chung Li , Trevor Rongey, Jr. , Sui Man Luk , Heting Fu , Samira Feili , Joseph Toombs , Hossein Heidari
- Applicant: Lawrence Livermore National Security, LLC , The Regents of the University of California
- Applicant Address: US CA Livermore
- Assignee: Lawrence Livermore National Security, LLC,The Regents of the University of California
- Current Assignee: Lawrence Livermore National Security, LLC,The Regents of the University of California
- Current Assignee Address: US CA Livermore; US CA Oakland
- Agency: Perkins Coie LLP
- Main IPC: G05B19/4099
- IPC: G05B19/4099 ; G06T7/00

Abstract:
A system for determining a light intensity field for use in manufacturing a 3D object from a volume of material. The system receives a 3D specification of a 3D geometry for the 3D object that specifies voxels within the volume that contain material that is to be part of the 3D object. The system employs a cost function for effectiveness of a light intensity field in manufacturing the 3D object. The cost function may be an adjoint of an Attenuated Radon Transform that models an energy dose that each voxel would receive during manufacture of the 3D object using the light intensity field. The system applies an optimization technique that employs the cost function to generate a measure of the effectiveness of possible light intensity fields and outputs an indication of a light intensity field that will be effective in manufacturing the 3D object.
Public/Granted literature
- US20220011742A1 COMPUTED AXIAL LITHOGRAPHY OPTIMIZATION SYSTEM Public/Granted day:2022-01-13
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