Invention Grant
- Patent Title: Compound, photoresist composition comprising same, photoresist pattern comprising same, and method for manufacturing photoresist pattern
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Application No.: US17046095Application Date: 2019-10-11
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Publication No.: US11834419B2Publication Date: 2023-12-05
- Inventor: Junhyun An , Minyoung Lim
- Applicant: LG CHEM, LTD.
- Applicant Address: KR Seoul
- Assignee: LG CHEM, LTD.
- Current Assignee: LG CHEM, LTD.
- Current Assignee Address: KR Seoul
- Agency: ROTHWELL, FIGG, ERNST & MANBECK, P.C.
- Priority: KR 20180120978 2018.10.11
- International Application: PCT/KR2019/013365 2019.10.11
- International Announcement: WO2020/076123A 2020.04.16
- Date entered country: 2020-10-08
- Main IPC: C07D237/26
- IPC: C07D237/26 ; C07C381/12 ; G03F7/004 ; C08F220/28 ; C08F232/08 ; G03F7/033
Abstract:
A compound represented by Chemical Formula 1, a photoresist composition comprising the same, a photoresist pattern comprising the same, and a method for preparing a photoresist pattern
Public/Granted literature
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