Invention Grant
- Patent Title: Semiconductor device
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Application No.: US17497639Application Date: 2021-10-08
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Publication No.: US11837599B2Publication Date: 2023-12-05
- Inventor: Masahiro Masunaga , Shinji Nomoto , Ryo Kuwana , Isao Hara
- Applicant: Hitachi, Ltd.
- Applicant Address: JP Tokyo
- Assignee: HITACHI, LTD.
- Current Assignee: HITACHI, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge, P.C.
- Priority: JP 20186277 2020.11.09
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H01L29/16

Abstract:
A semiconductor device includes an electrostatic protection circuit 1 and a MOSFET 2 including a gate terminal. The electrostatic protection circuit 1 includes a positive-side power supply terminal 3, a negative-side power supply terminal 5, a first protection diode 4, a second protection diode 6, a resistance element 7, and a bipolar transistor 8. The second protection diode 6 includes an anode terminal electrically connected to the negative-side power supply terminal 5 via the resistance element 7, and a cathode terminal electrically connected to the gate terminal. The bipolar transistor 8 includes a base terminal, an emitter terminal, and a collector terminal. The bipolar transistor 8 is electrically connected to the anode terminal of the second protection diode 6, the gate terminal, and the positive-side power supply terminal 3. The electrostatic protection circuit 1 is formed on a semiconductor substrate made of silicon carbide.
Public/Granted literature
- US20220149035A1 SEMICONDUCTOR DEVICE Public/Granted day:2022-05-12
Information query
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