An imprint apparatus that forms a pattern of an imprint material on a plurality of shot regions in a substrate by using a mold, the imprint apparatus comprising: a discharger configured to discharge the imprint material onto the plurality of shot regions in the substrate; a viscosity adjuster configured to adjust a viscosity of the imprint material discharged from the discharger; and a controller configured to form the pattern of the imprint material in the plurality of shot regions, by repeatedly bringing the imprint material into contact with the mold in a state where a viscosity of at least a portion of the imprint material discharged onto the plurality of shot regions is adjusted by the viscosity adjuster, and curing of the imprint material, for each of the plurality of shot regions.