Invention Grant
- Patent Title: Method of processing a substrate
-
Application No.: US17393843Application Date: 2021-08-04
-
Publication No.: US11842926B2Publication Date: 2023-12-12
- Inventor: Kensuke Nagaoka , Yasuyoshi Yubira
- Applicant: DISCO Corporation
- Applicant Address: JP Tokyo
- Assignee: DISCO CORPORATION
- Current Assignee: DISCO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain Ltd.
- Priority: DE 2020210104.3 2020.08.10
- Main IPC: H01L21/78
- IPC: H01L21/78 ; H01L21/683

Abstract:
This invention relates to a method of processing a substrate, having on one side a device area with a plurality of devices. The method includes attaching a first protective film to the one side of the substrate, so that at least a central area of a front surface of the first protective film is in direct contact with the one side of the substrate, and attaching a second protective film to the opposite side of the substrate. After attaching the second protective film, a laser beam is applied to the substrate from the opposite side of the substrate. The substrate and second protective film are transparent to the laser beam. The laser beam is applied to the substrate in a plurality of positions so as to form a plurality of modified regions in the substrate.
Information query
IPC分类: