Invention Grant
- Patent Title: In-plane magnetized spin-orbit magnetic device
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Application No.: US17168146Application Date: 2021-02-04
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Publication No.: US11844288B2Publication Date: 2023-12-12
- Inventor: Hsin-Han Lee , Jeng-Hua Wei , I-Jung Wang , Shan-Yi Yang , Yao-Jen Chang
- Applicant: Industrial Technology Research Institute
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- Priority: TW 9134728 2020.10.07
- Main IPC: H10N52/80
- IPC: H10N52/80 ; H10N50/85 ; H10N52/00 ; H10B61/00

Abstract:
An in-plane magnetized spin-orbit magnetic device is provided. The in-plane magnetized spin-orbit magnetic device includes a heavy metal layer, an upper electrode and a magnetic tunnel junction. The magnetic tunnel junction is disposed between the heavy metal layer and the upper electrode. The magnetic tunnel junction includes a free layer and a pinned layer. The free layer is disposed on the heavy metal layer, and the free layer has a first film plane area. The pinned layer is disposed on the free layer, and the pinned layer has a second film plane area. There is a preset angle between a long axis direction of a film plane shape of the free layer and a long axis direction of a film plane shape of the pinned layer, and the first film plane area is larger than the second film plane area.
Public/Granted literature
- US20220109100A1 IN-PLANE MAGNETIZED SPIN-ORBIT MAGNETIC DEVICE Public/Granted day:2022-04-07
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