Invention Grant
- Patent Title: Pulsed cathodic arc deposition
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Application No.: US17430026Application Date: 2020-02-10
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Publication No.: US11851746B2Publication Date: 2023-12-26
- Inventor: Jukka Kolehmainen
- Applicant: Oerlikon Surface Solutions AG, Pfäffikon
- Applicant Address: CH Pfäffikon
- Assignee: Oerlikon Surface Solutions AG, Pfäffikon
- Current Assignee: Oerlikon Surface Solutions AG, Pfäffikon
- Current Assignee Address: CH Pfäffikon
- Agency: Bozicevic, Field & Francis LLP
- Agent Bret E. Field
- International Application: PCT/EP2020/000040 2020.02.10
- International Announcement: WO2020/173598A 2020.09.03
- Date entered country: 2021-08-11
- Main IPC: C23C14/32
- IPC: C23C14/32 ; H01J37/32 ; H01J37/34

Abstract:
An assembly for cathodic arc deposition of a material onto an article. The assembly includes a chamber for receiving an article to be coated and a rotating target. The rotatable target has a surface from which a plasma material is ejected. An anode ring is positioned a first distance from the surface of the rotatable target. The anode ring has an opening with a central axis that is parallel to a rotational axis of the rotatable target and offset a second distance from the rotational axis. A spark device is disposed in the chamber for generating an arc on the surface of the rotatable target. The assembly configured to direct a stream of charged particles ejected from the surface of the target through the opening of the anode ring to the article to be coated.
Public/Granted literature
- US20220112591A1 Pulsed Cathodic Arc Deposition Public/Granted day:2022-04-14
Information query
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