Invention Grant
- Patent Title: Wafer inspection method and apparatus thereof
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Application No.: US17585552Application Date: 2022-01-27
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Publication No.: US11852465B2Publication Date: 2023-12-26
- Inventor: Shang-Chi Wang , Miao-Pei Chen , Han-Zong Wu , Chia-Chi Tsai , I-Ching Li
- Applicant: GlobalWafers Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: GlobalWafers Co., Ltd.
- Current Assignee: GlobalWafers Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- Priority: TW 0112054 2021.04.01
- Main IPC: G01B11/30
- IPC: G01B11/30 ; G01N21/95 ; G01N21/93

Abstract:
The disclosure provides a wafer inspection method and wafer inspection apparatus. The method includes: receive scanning information of at least one wafer, wherein the scanning information includes a plurality of haze values; the scanning information is divided into a plurality of information blocks according to the unit block, and the feature value of each of the plurality of information blocks is calculated according to the plurality of haze values included in each of the plurality of information blocks; and converting the feature value into a color value according to the haze upper threshold and the haze lower threshold, generating the color value corresponding to the at least one wafer according to the converted color value according to the feature value, whereby the color graph displays the texture content of the at least one wafer.
Public/Granted literature
- US20220316872A1 WAFER INSPECTION METHOD AND APPARATUS THEREOF Public/Granted day:2022-10-06
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