Invention Grant
- Patent Title: Determination of measurement error in an etalon
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Application No.: US17928384Application Date: 2021-05-25
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Publication No.: US11860036B2Publication Date: 2024-01-02
- Inventor: Russell Allen Burdt , John Theodore Melchior , Kuo-Tai Teng
- Applicant: Cymer, LLC
- Applicant Address: US CA San Diego
- Assignee: Cymer, LLC
- Current Assignee: Cymer, LLC
- Current Assignee Address: US CA San Diego
- Agency: DiBerardino McGovern IP Group LLC
- International Application: PCT/US2021/034101 2021.05.25
- International Announcement: WO2021/262373A 2021.12.30
- Date entered country: 2022-11-29
- Main IPC: G01B9/02055
- IPC: G01B9/02055 ; G01J3/28 ; G01J3/26 ; G01J9/02 ; G03F7/00

Abstract:
Information relating to an etalon is accessed, the etalon being associated with a calibration parameter having a pre-set default value, the etalon being configured to produce an interference pattern including a plurality of fringes from a received light beam, and the information relating to the etalon including first spatial information related to a first fringe of the plurality of fringes and second spatial information related to a second fringe of the plurality of fringes. A first wavelength value of the received light beam is determined based on the spatial information related to the first fringe and an initial value of the calibration parameter. A second wavelength value of the received light beam is determined based on the spatial information related to the second fringe and the initial value of the calibration parameter. The first wavelength value and the second wavelength value are compared to determine a measurement error value.
Public/Granted literature
- US20230142333A1 DETERMINATION OF MEASUREMENT ERROR IN AN ETALON Public/Granted day:2023-05-11
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