Invention Grant
- Patent Title: Device, apparatus, and method for semiconductor transfer
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Application No.: US17369360Application Date: 2021-07-07
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Publication No.: US11862502B2Publication Date: 2024-01-02
- Inventor: Qiyuan Wei , Ying-chi Wang , Cheng-ming Liu , Chien-hung Lin , Li-wei Kung
- Applicant: CHONGQING KONKA PHOTOELECTRIC TECHNOLOGY RESEARCH INSTITUTE CO., LTD.
- Applicant Address: CN Chongqing
- Assignee: CHONGQING KONKA PHOTOELECTRIC TECHNOLOGY RESEARCH INSTITUTE CO., LTD.
- Current Assignee: CHONGQING KONKA PHOTOELECTRIC TECHNOLOGY RESEARCH INSTITUTE CO., LTD.
- Current Assignee Address: CN Chongqing
- Agency: Hauptman Ham, LLP
- Priority: CN 2010317744.1 2020.04.21
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L21/68 ; H01F7/20 ; B25J15/06 ; B25J13/08 ; B25J15/00 ; H01F7/06

Abstract:
A device, apparatus, and method for semiconductor transfer are provided. A transfer substrate is controlled to be moved to be above the target substrate. An infrared emitting portion emits infrared signals to position a semiconductor on a target substrate. After a second magnetic portion picks up the semiconductor from the target substrate, a controller outputs a first control current to a first electromagnetic portion to cause the first electromagnetic portion to generate an electromagnetic force, to control the second magnetic portion to adjust a position of the picked-up semiconductor relative to the welding position on the target substrate, where adjusting the position of the picked up semiconductor includes horizontal adjustment.
Public/Granted literature
- US20210335648A1 DEVICE, APPARATUS, AND METHOD FOR SEMICONDUCTOR TRANSFER Public/Granted day:2021-10-28
Information query
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