Invention Grant
- Patent Title: Power gating cell structure
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Application No.: US17021045Application Date: 2020-09-15
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Publication No.: US11862620B2Publication Date: 2024-01-02
- Inventor: Wei-Ling Chang , Jung-Chan Yang , Li-Chun Tien , Ting Yu Chen
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: MERCHANT & GOULD P.C.
- Main IPC: H01L23/528
- IPC: H01L23/528 ; H01L27/02 ; H01L21/8234 ; H01L27/088 ; H03K19/17772

Abstract:
A power gating cell on an integrated circuit is provided. The power gating cell includes: a central area; a peripheral area surrounding the central area; a first active region located in the central area, the first active region having a first width in a first direction corresponding to at least four fin structures extending in a second direction perpendicular to the first direction; and a plurality of second active regions located in the peripheral area, each second active region having a second width in the first direction corresponding to at least one and no more than three fin structures extending in the second direction.
Public/Granted literature
- US20220085005A1 Power Gating Cell Structure Public/Granted day:2022-03-17
Information query
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