Invention Grant
- Patent Title: Electrode slurry coating apparatus and method for forming double active material layers
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Application No.: US17278919Application Date: 2020-09-16
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Publication No.: US11862782B2Publication Date: 2024-01-02
- Inventor: Taek Soo Lee , Young Joon Jo , Sang Hoon Choy , Ki Tae Kim , Ji Hee Yoon , Cheol Woo Kim
- Applicant: LG Chem, Ltd.
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: Lerner David LLP
- Priority: KR 20190128891 2019.10.17
- International Application: PCT/KR2020/012451 2020.09.16
- International Announcement: WO2021/075737A 2021.04.22
- Date entered country: 2021-03-23
- Main IPC: H01M4/04
- IPC: H01M4/04 ; B05C5/02 ; B05C11/10 ; H01M10/0525
Abstract:
The present invention relates to electrode slurry coating apparatus and method, the present invention ultimately allowing the process efficiency to be increased and rate of errors to be reduced when double-layer structured active material layers are formed by temporally adjusting the height of first and second discharge outlets through which active material is discharged.
Public/Granted literature
- US20220006064A1 Electrode Slurry Coating Apparatus and Method for Forming Double Active Material Layers Public/Granted day:2022-01-06
Information query
