Invention Grant
- Patent Title: Pellicle and method of using the same
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Application No.: US18047342Application Date: 2022-10-18
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Publication No.: US11868041B2Publication Date: 2024-01-09
- Inventor: Chue San Yoo , Hsin-Chang Lee , Pei-Cheng Hsu , Yun-Yue Lin
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Hauptman Ham, LLP
- Main IPC: G03F1/62
- IPC: G03F1/62 ; G03F1/64 ; G03F7/20

Abstract:
A pellicle frame includes a check valve, wherein the check valve is configured to permit gas flow from an interior of the pellicle to an exterior of the pellicle. The pellicle frame further includes a bottom surface of the frame defines only a single recess therein. The pellicle frame further includes a gasket configured to fit within the single recess.
Public/Granted literature
- US20230061320A1 PELLICLE AND METHOD OF USING THE SAME Public/Granted day:2023-03-02
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