Invention Grant
- Patent Title: Negative type photosensitive siloxane composition and methods for producing cured film and electronic device using the same
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Application No.: US16767250Application Date: 2018-11-26
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Publication No.: US11868048B2Publication Date: 2024-01-09
- Inventor: Masanobu Hayashi
- Applicant: Merck Patent GmbH
- Applicant Address: DE Darmstadt
- Assignee: Merck Patent GmbH
- Current Assignee: Merck Patent GmbH
- Current Assignee Address: DE Darmstadt
- Agency: Faegre Drinker Biddle & Reath LLP
- Priority: JP 17226891 2017.11.27
- International Application: PCT/EP2018/082475 2018.11.26
- International Announcement: WO2019/101978A 2019.05.31
- Date entered country: 2020-05-27
- Main IPC: G03F7/075
- IPC: G03F7/075 ; G03F7/38 ; G03F7/40 ; C07C235/34 ; C07D211/22 ; C08G77/04 ; C09D183/04 ; G03F7/004 ; G03F7/16 ; G03F7/20 ; G03F7/32
Abstract:
[Object] To provide a negative type photosensitive siloxane composition capable of forming a cured film excellent in heat resistance and critical thickness for cracking [Means] The present invention provides a negative type photosensitive siloxane composition comprising: a polysiloxane containing silanol in a specific content, a particular photo base generator, and a solvent. The content of silanol is measured by FT-IR.
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