Invention Grant
- Patent Title: Semiconductor storage device including a voltage generator for applying first and second intermediate voltages to an adjacent word line in a program operation
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Application No.: US17464297Application Date: 2021-09-01
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Publication No.: US11869597B2Publication Date: 2024-01-09
- Inventor: Takeshi Nakano , Yuzuru Shibazaki , Hideyuki Kataoka , Junichi Sato , Hiroki Date
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP 21045259 2021.03.18
- Main IPC: G11C16/10
- IPC: G11C16/10 ; G11C16/26 ; G11C16/30 ; G11C29/42 ; G11C16/08 ; G11C16/04 ; G11C16/24

Abstract:
A semiconductor storage device in an embodiment includes a plurality of planes each including a memory cell array, a voltage generation circuit configured to apply a first intermediate voltage to an adjacent word line adjacent to a selected word line in a former half of a program period and apply a second intermediate voltage higher than the first intermediate voltage to the adjacent word line in a latter half of the program period, a discharge circuit configured to feed a discharge current from the selected word line in a period corresponding to a period in which the second intermediate voltage is applied to the adjacent word line, and a control circuit configured to set a discharge characteristic of the discharge circuit according to a number of the planes.
Public/Granted literature
- US20220301630A1 SEMICONDUCTOR STORAGE DEVICE Public/Granted day:2022-09-22
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