Invention Grant
- Patent Title: High throughput multi-electron beam system
-
Application No.: US17317861Application Date: 2021-05-11
-
Publication No.: US11869743B2Publication Date: 2024-01-09
- Inventor: Xinrong Jiang
- Applicant: KLA Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA CORPORATION
- Current Assignee: KLA CORPORATION
- Current Assignee Address: US CA Milpitas
- Agency: Hodgson Russ LLP
- Main IPC: H01J37/09
- IPC: H01J37/09 ; H01J37/12 ; H01J37/073 ; H01J37/14

Abstract:
Multiple electron beamlets are split from a single electron beam. The electron beam passes through an acceleration tube, a beam-limiting aperture, an anode disposed between an electron beam source and the acceleration tube, a focusing lens downstream from the beam-limiting aperture, and a micro aperture array downstream from the acceleration tube. The micro aperture array generates beamlets from the electron beam. The electron beam can be focused from a divergent illumination beam into a telecentric illumination beam.
Public/Granted literature
- US20220367140A1 HIGH THROUGHPUT MULTI-ELECTRON BEAM SYSTEM Public/Granted day:2022-11-17
Information query