Invention Grant
- Patent Title: Semiconductor device and production method
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Application No.: US17210498Application Date: 2021-03-24
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Publication No.: US11869960B2Publication Date: 2024-01-09
- Inventor: Soichi Yoshida
- Applicant: FUJI ELECTRIC CO., LTD.
- Applicant Address: JP Kanagawa
- Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee Address: JP Kanagawa
- Priority: JP 19077535 2019.04.16
- Main IPC: H01L29/739
- IPC: H01L29/739 ; H01L29/861

Abstract:
Provided is a semiconductor device, comprising a semiconductor substrate; and an emitter electrode provided above an upper surface of the semiconductor substrate; wherein the semiconductor substrate has: a first conductive type drift region; a second conductive type base region provided between the drift region and the upper surface of the semiconductor substrate; a second conductive type contact region with a higher doping concentration than the base region, which is provided between the base region and the upper surface of the semiconductor substrate; a trench contact of a conductive material provided to connect to the emitter electrode and penetrate the contact region; and a second conductive type high-concentration plug region with a higher doping concentration than the contact region, which is provided in contact with a bottom portion of the trench contact.
Public/Granted literature
- US11955540B2 Semiconductor device and production method Public/Granted day:2024-04-09
Information query
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