Invention Grant
- Patent Title: Surface-fluorinated silicon-containing electrodes
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Application No.: US17161333Application Date: 2021-01-28
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Publication No.: US11870055B2Publication Date: 2024-01-09
- Inventor: Liwen Ji , Benjamin Yong Park , Robert A. Rango , Dong Sun , Frederic C. Bonhomme
- Applicant: Enevate Corporation
- Applicant Address: US CA Irvine
- Assignee: Enevate Corporation
- Current Assignee: Enevate Corporation
- Current Assignee Address: US CA Irvine
- Agency: McAndrews, Held & Malloy, Ltd.
- Main IPC: H01M4/134
- IPC: H01M4/134 ; H01M4/36 ; H01M4/04 ; H01M4/02

Abstract:
The present application describes the use of a solid electrolyte interphase (SEI) fluorinating precursor and/or an SEI fluorinating compound to coat an electrode material and create an artificial SEI layer. These modifications may increase surface passivation of the electrodes, SEI robustness, and structural stability of the silicon-containing electrodes.
Public/Granted literature
- US20210159485A1 SURFACE-FLUORINATED SILICON-CONTAINING ELECTRODES Public/Granted day:2021-05-27
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