- Patent Title: Method for manufacturing a substrate for a radiofrequency device
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Application No.: US17041367Application Date: 2019-03-26
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Publication No.: US11870411B2Publication Date: 2024-01-09
- Inventor: Djamel Belhachemi , Thierry Barge
- Applicant: Soitec
- Applicant Address: FR Bernin
- Assignee: SOITEC
- Current Assignee: SOITEC
- Current Assignee Address: FR Bernin
- Agency: TraskBritt
- Priority: FR 52574 2018.03.26
- International Application: PCT/FR2019/050685 2019.03.26
- International Announcement: WO2019/186053A 2019.10.03
- Date entered country: 2020-09-24
- Main IPC: H10N30/08
- IPC: H10N30/08 ; H03H3/10 ; C09J7/30 ; H03H9/02 ; H03H9/25 ; H03H9/64 ; H10N30/073 ; H10N30/082 ; H10N30/086

Abstract:
A process for fabricating a substrate for a radiofrequency device by joining a piezoelectric layer to a carrier substrate by way of an electrically insulating layer, the piezoelectric layer having a rough surface at its interface with the electrically insulating layer, the process being characterized in that it comprises the following steps: —providing a piezoelectric substrate having a rough surface for reflecting a radiofrequency wave, —depositing a dielectric layer on the rough surface of the piezoelectric substrate, —providing a carrier substrate, —depositing a photo-polymerizable adhesive layer on the carrier substrate, —bonding the piezoelectric substrate to the carrier substrate by way of the dielectric layer and of the adhesive layer, in order to form an assembled substrate, —irradiating the assembled substrate with a light flux in order to polymerize the adhesive layer, the adhesive layer and the dielectric layer together forming the electrically insulating layer.
Public/Granted literature
- US20210075389A1 METHOD FOR MANUFACTURING A SUBSTRATE FOR A RADIOFREQUENCY DEVICE Public/Granted day:2021-03-11
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