Invention Grant
- Patent Title: Semiconductor storage device and manufacturing method thereof
-
Application No.: US17010195Application Date: 2020-09-02
-
Publication No.: US11871577B2Publication Date: 2024-01-09
- Inventor: Takayuki Kashima , Hiroyasu Sato
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: KIOXIA CORPORATION
- Current Assignee: KIOXIA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JP 20012717 2020.01.29
- Main IPC: H10B43/50
- IPC: H10B43/50 ; H01L21/3213 ; H01L21/311 ; H10B43/10 ; H10B43/27 ; H10B43/35 ; H10B43/40

Abstract:
According to one embodiment, a semiconductor storage device includes a substrate; a stacked body provided above the substrate, wherein the stacked body includes a plurality of first insulating layers and a plurality of conductive layers that are alternately stacked on top of one another along a vertical direction; a plurality of columnar portions that penetrate the stacked body; a first slit, provided in the vertical direction, that divides one or more of the plurality of conductive layers at least at an upper portion of the stacked body; and a second insulating layer that overlays an opening of the first slit, which forms a cavity.
Public/Granted literature
- US20210233925A1 SEMICONDUCTOR STORAGE DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2021-07-29
Information query