Invention Grant
- Patent Title: Ferroelectric memory cell
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Application No.: US17472479Application Date: 2021-09-10
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Publication No.: US11871581B2Publication Date: 2024-01-09
- Inventor: Chung-Liang Cheng , Huang-Lin Chao
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: H10B53/20
- IPC: H10B53/20 ; H01L29/423 ; H10B51/20 ; H10B53/00 ; H01L23/528 ; H01L23/522 ; H10B51/10 ; H10B53/10

Abstract:
A ferroelectric memory cell (FeRAM) is disclosed that includes an active device (e.g., a transistor) and a passive device (e.g., a ferroelectric capacitor) integrated in a substrate. The transistor and its gate contacts are formed on a front side of the substrate. A carrier wafer can be bonded to the active device to allow the active device to be inverted so that the passive device and associated contacts can be electrically coupled from a back side of the substrate.
Public/Granted literature
- US20220310638A1 FERROELECTRIC MEMORY CELL Public/Granted day:2022-09-29
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