Invention Grant
- Patent Title: Photoaligning polymer materials
-
Application No.: US16636411Application Date: 2018-08-08
-
Publication No.: US11874563B2Publication Date: 2024-01-16
- Inventor: Cedric Klein , Fabien Xavier Delbaere , Richard Frantz
- Applicant: ROLIC TECHNOLOGIES AG
- Applicant Address: CH Allschwil
- Assignee: ROLIC TECHNOLOGIES AG
- Current Assignee: ROLIC TECHNOLOGIES AG
- Current Assignee Address: CH Allschwil
- Agency: Sughrue Mion, PLLC
- Priority: EP 185479 2017.08.09
- International Application: PCT/EP2018/071530 2018.08.08
- International Announcement: WO2019/030292A 2019.02.14
- Date entered country: 2020-02-04
- Main IPC: G02F1/1337
- IPC: G02F1/1337 ; C08F220/30 ; C08F220/34

Abstract:
The present invention relates to novel photoaligning polymer materials, to their use as orienting layer for liquid crystals, which are used for the production of non-structured and structured optical elements, electro-optical elements, multi-layer systems or in nanoelectronics.
Public/Granted literature
- US20200174322A1 PHOTOALIGNING POLYMER MATERIALS Public/Granted day:2020-06-04
Information query
IPC分类: