Invention Grant
- Patent Title: Radiation curable ink jet composition and ink jet method
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Application No.: US17210601Application Date: 2021-03-24
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Publication No.: US11884828B2Publication Date: 2024-01-30
- Inventor: Kiyoshi Nakamura , Toru Saito , Toshiyuki Yoda , Naoki Koike
- Applicant: Seiko Epson Corporation
- Applicant Address: JP Toyko
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Toyko
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP 20053854 2020.03.25
- Main IPC: C09D11/107
- IPC: C09D11/107 ; B41J11/00 ; B41M5/00 ; C09D11/322 ; C09D11/38

Abstract:
A radiation curable ink jet composition includes polymerizable compounds; and a photopolymerization initiator, the polymerizable compounds include a vinyl ether group-containing (meth)acrylate represented by the following general formula (I), a content of the vinyl ether group-containing (meth)acrylate with respect to a total mass of the radiation curable ink jet composition is 15 percent by mass or more, and the photopolymerization initiator includes ethyl (2,4,6-trimethylbenzoyl)phenylphosphinate.
H2C═CR1—CO—OR2—O—CH═CH—R3 (I)
In the above formula, R1 represents a hydrogen atom or a methyl group, R2 represents a divalent organic residue having 2 to 20 carbon atoms, and R3 represents a hydrogen atom or a monovalent organic residue having 1 to 11 carbon atoms.
H2C═CR1—CO—OR2—O—CH═CH—R3 (I)
In the above formula, R1 represents a hydrogen atom or a methyl group, R2 represents a divalent organic residue having 2 to 20 carbon atoms, and R3 represents a hydrogen atom or a monovalent organic residue having 1 to 11 carbon atoms.
Public/Granted literature
- US20210301162A1 Radiation Curable Ink Jet Composition And Ink Jet Method Public/Granted day:2021-09-30
Information query
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