Invention Grant
- Patent Title: Cleaning compositions and methods of use thereof
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Application No.: US17411429Application Date: 2021-08-25
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Publication No.: US11884900B2Publication Date: 2024-01-30
- Inventor: Zachary L. Schaefer , Eric Turner , Carl Ballesteros
- Applicant: Fujifilm Electronic Materials U.S.A., Inc.
- Applicant Address: US RI N. Kingstown
- Assignee: Fujifilm Electronic Materials U.S.A., Inc.
- Current Assignee: Fujifilm Electronic Materials U.S.A., Inc.
- Current Assignee Address: US RI N. Kingstown
- Agency: Fish & Richardson P.C.
- Main IPC: C11D1/66
- IPC: C11D1/66 ; C11D11/00 ; H01L21/02 ; C11D3/20 ; C11D1/00
Abstract:
The present disclosure relates to cleaning compositions that are used to clean semiconductor substrates. These cleaning compositions can remove the defects/contaminants arising from previous processing on the semiconductor substrates and thereby make the substrates appropriate for further processing. The cleaning compositions described herein primarily contain at least one pH adjusting agent and at least one biosurfactant.
Public/Granted literature
- US20220064577A1 CLEANING COMPOSITIONS AND METHODS OF USE THEREOF Public/Granted day:2022-03-03
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