Invention Grant
- Patent Title: Rotational drive device, substrate processing apparatus, and rotational driving method
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Application No.: US17110719Application Date: 2020-12-03
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Publication No.: US11885003B2Publication Date: 2024-01-30
- Inventor: Junnosuke Taguchi , Yasutomo Kimura
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Venjuris, P.C.
- Priority: JP 19223713 2019.12.11
- Main IPC: C23C16/458
- IPC: C23C16/458 ; H01L21/67 ; C23C16/455
Abstract:
A rotational drive device includes a first rotator configured to rotate with respect to a stator, a plurality of second rotators configured to rotate with respect to the first rotator, a plurality of drivers configured to rotatably drive the respective second rotators, and a plurality of driver controllers configured to rotate integrally with the first rotator and to control rotation of the drivers, respectively, the respective driver controllers being connected to one another by a communication network.
Public/Granted literature
- US20210180187A1 ROTATIONAL DRIVE DEVICE, SUBSTRATE PROCESSING APPARATUS, AND ROTATIONAL DRIVING METHOD Public/Granted day:2021-06-17
Information query
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