Invention Grant
- Patent Title: Pulsating vapor chamber
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Application No.: US17105101Application Date: 2020-11-25
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Publication No.: US11885571B2Publication Date: 2024-01-30
- Inventor: Jen-Chih Cheng
- Applicant: COOLER MASTER CO., LTD.
- Applicant Address: TW New Taipei
- Assignee: Cooler Master Co., Ltd.
- Current Assignee: Cooler Master Co., Ltd.
- Current Assignee Address: TW New Taipei
- Agency: Dickinson Wright PLLC
- The original application number of the division: US16157879 2018.10.11
- Main IPC: F28D15/02
- IPC: F28D15/02

Abstract:
A pulsating vapor chamber has an inner board, a first outer board, a second outer board, an asymmetric loop, and a working fluid. The inner board has a first surface and a second surface. The first and second outer boards are mounted on the first surface and the second surface of the inner board respectively. The asymmetric loop is located between the first and second outer boards and has multiple channels communicating with each other in sequence. A part of the channels are formed between the first outer board and the inner board, and the remaining channels are formed between the second outer board and the inner board. With the asymmetric loop, even if the vapor chamber is disposed horizontally, pressure may be changed by different amount in the channels so that the working fluid is still able to oscillate or circulate.
Public/Granted literature
- US20210080190A1 PULSATING VAPOR CHAMBER Public/Granted day:2021-03-18
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