Invention Grant
- Patent Title: Duplicate circuit section identification and processing for optical proximity correction (OPC) processes in electronic design automation (EDA) applications
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Application No.: US17212074Application Date: 2021-03-25
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Publication No.: US11886788B2Publication Date: 2024-01-30
- Inventor: Jea Woo Park , Soohong Kim
- Applicant: Siemens Industry Software Inc.
- Applicant Address: US TX Plano
- Assignee: Siemens Industry Software Inc.
- Current Assignee: Siemens Industry Software Inc.
- Current Assignee Address: US TX Plano
- Main IPC: G06F30/392
- IPC: G06F30/392 ; G06F30/398

Abstract:
A computing system may include a circuit design access engine configured to access a circuit design. The computing system may also include a duplicate section processing engine configured to partition the circuit design into multiple circuit sections and determine, from among the multiple circuit sections, an identical section set based on duplicate criteria. Circuit sections of the identical section set may satisfy the duplicate criteria with respect to one another. The duplicate section processing engine may further be configured to perform an OPC processing operation on a selected circuit section of the identical section set and apply an OPC result of the performed OPC processing operation for other circuit sections of the identical section set instead of or without performing the OPC processing operation on the other circuit sections of the identical section set.
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