Invention Grant
- Patent Title: Semiconductor manufacturing apparatus and earth shield
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Application No.: US17349272Application Date: 2021-06-16
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Publication No.: US11887826B2Publication Date: 2024-01-30
- Inventor: Takashi Izumi , Akitsugu Hatazaki
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP 20150783 2020.09.08
- Main IPC: H01J37/34
- IPC: H01J37/34

Abstract:
A semiconductor manufacturing apparatus according to an embodiment includes a stage, a backing plate and an earth shield. The stage is configured to hold a substrate that a film is to be deposited on. The backing plate faces the stage and is configured such that a target containing a film deposition material is to be joined. The earth shield has an opening configured to enclose the target, and a plurality of through holes provided over a whole circumference of a circumferential part of the opening.
Public/Granted literature
- US20220076934A1 SEMICONDUCTOR MANUFACTURING APPARATUS AND EARTH SHIELD Public/Granted day:2022-03-10
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