Invention Grant
- Patent Title: Deposition tool and method for depositing metal oxide films on organic materials
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Application No.: US16804706Application Date: 2020-02-28
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Publication No.: US11887846B2Publication Date: 2024-01-30
- Inventor: Akhil Singhal , Patrick Van Cleemput
- Applicant: Lam Research Corporation
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Weaver Austin Villeneuve & Sampson LLP
- The original application number of the division: US16052286 2018.08.01
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/033 ; C23C16/455 ; C23C16/40
Abstract:
An Atomic Layer Deposition (ALD) method to deposit a metal oxide layer onto an organic photoresist on a substrate using a highly reactive organic metal precursor. The deposition method protects the organic photoresist from loss and degradation from exposure to oxygen species during subsequent ALD cycles. The organic metal precursor may be an amino type precursor or a methoxy type precursor.
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