Invention Grant
- Patent Title: Electronic devices and systems, and methods for making and using the same
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Application No.: US17343756Application Date: 2021-06-10
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Publication No.: US11887895B2Publication Date: 2024-01-30
- Inventor: Scott E. Thompson , Damodar R. Thummalapally
- Applicant: United Semiconductor Japan Co., Ltd.
- Applicant Address: JP Kuwana
- Assignee: United Semiconductor Japan Co., Ltd.
- Current Assignee: United Semiconductor Japan Co., Ltd.
- Current Assignee Address: JP Kuwana
- Agent Winston Hsu
- The original application number of the division: US15398471 2017.01.04
- Main IPC: H01L21/8234
- IPC: H01L21/8234 ; H01L21/8238 ; H01L21/84 ; H01L27/02 ; H01L29/10 ; H01L29/66 ; H01L29/78 ; H10B10/00 ; H01L21/265 ; H01L21/02 ; H01L27/092 ; H01L29/06

Abstract:
Some structures and methods to reduce power consumption in devices can be implemented largely by reusing existing bulk CMOS process flows and manufacturing technology, allowing the semiconductor industry as well as the broader electronics industry to avoid a costly and risky switch to alternative technologies. Some of the structures and methods relate to a Deeply Depleted Channel (DDC) design, allowing CMOS based devices to have a reduced σVT compared to conventional bulk CMOS and can allow the threshold voltage VT of FETs having dopants in the channel region to be set much more precisely. The DDC design also can have a strong body effect compared to conventional bulk CMOS transistors, which can allow for significant dynamic control of power consumption in DDC transistors. Additional structures, configurations, and methods presented herein can be used alone or in conjunction with the DDC to yield additional and different benefits.
Public/Granted literature
- US20210313231A1 ELECTRONIC DEVICES AND SYSTEMS, AND METHODS FOR MAKING AND USING THE SAME Public/Granted day:2021-10-07
Information query
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