Invention Grant
- Patent Title: Semiconductor storage device with insulating layers for etching stop
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Application No.: US17188423Application Date: 2021-03-01
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Publication No.: US11887926B2Publication Date: 2024-01-30
- Inventor: Hideto Takekida , Shotaro Kuzukawa , Kazuhiro Nojima
- Applicant: KIOXIA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Agency: Kim & Stewart LLP
- Priority: JP 20146444 2020.08.31
- Main IPC: H01L23/522
- IPC: H01L23/522 ; H10B41/27 ; H10B43/27 ; H10B43/40 ; H10B43/10

Abstract:
A semiconductor storage device includes a substrate and a memory cell array. The memory cell array is above the substrate in a first direction. The memory cell array includes first to third regions arranged in a second direction. The memory cell array comprises a first stack in the first and third regions, first and second semiconductor layers extending through the first stack in the first and third regions, respectively, a second stack in the second region, a first contact extending through the second stack, a fourth insulating layer extending in the first and second directions in the second region, and a fifth insulating layer extending in the first direction and a third direction in the second region. A distance from a bottom end of the fourth insulating layer to the substrate is different from a distance from a bottom end of the fifth insulating layer to the substrate.
Public/Granted literature
- US20220068804A1 SEMICONDUCTOR STORAGE DEVICE Public/Granted day:2022-03-03
Information query
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