Invention Grant
- Patent Title: Vertical interconnect elevator based on through silicon vias
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Application No.: US16984663Application Date: 2020-08-04
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Publication No.: US11887930B2Publication Date: 2024-01-30
- Inventor: Jin-Yuan Lee , Mou-Shiung Lin
- Applicant: iCometrue Company Ltd.
- Applicant Address: TW Zhubei
- Assignee: iCometrue Company Ltd.
- Current Assignee: iCometrue Company Ltd.
- Current Assignee Address: TW Hsin-Chu County
- Main IPC: H01L23/528
- IPC: H01L23/528 ; H01L23/522 ; H01L23/532 ; H01L23/00 ; G11C11/412 ; G11C7/10

Abstract:
A chip package includes a first integrated-circuit (IC) chip; a second integrated-circuit (IC) chip over the first integrated-circuit (IC) chip; a connector over the first integrated-circuit (IC) chip and on a same horizontal level as the second integrated-circuit (IC) chip, wherein the connector comprises a substrate over the first integrated-circuit (IC) chip and a plurality of through vias vertically extending through the substrate of the connector; a polymer layer over the first integrated-circuit (IC) chip, wherein the polymer layer has a portion between the second integrated-circuit (IC) chip and connector, wherein the polymer layer has a top surface coplanar with a top surface of the second integrated-circuit (IC) chip, a top surface of the substrate of the connector and a top surface of each of the plurality of through vias; and an interconnection scheme on the top surface of the polymer layer, the top surface of the second integrated-circuit (IC) chip, the top surface of the connector and the top surface of each of the plurality of through vias.
Public/Granted literature
- US20210043557A1 VERTICAL INTERCONNECT ELEVATOR BASED ON THROUGH SILICON VIAS Public/Granted day:2021-02-11
Information query
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