Invention Grant
- Patent Title: Dual port SRAM cell and design method thereof
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Application No.: US17698336Application Date: 2022-03-18
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Publication No.: US11889673B2Publication Date: 2024-01-30
- Inventor: Sangshin Han , Taehyung Kim
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR 20210085765 2021.06.30
- Main IPC: G11C11/00
- IPC: G11C11/00 ; H10B10/00 ; G11C11/412 ; G11C11/419

Abstract:
An integrated circuit includes: a dual port Static Random Access Memory (SRAM) cell including a plurality of transistors; a bit line pair connected to the dual port SRAM cell, the bit line pair including a first bit line and a second bit line spaced apart from each other in a first direction and extending in a second direction perpendicular to the first direction; a power line group including a plurality of power lines spaced apart from each other in the first direction, spaced apart from the bit line pair placed in the first direction, and extending in the second direction, the power line group being configured to apply a voltage to the dual-port SRAM cell; and a first word line provided between the first bit line and the second bit line and connected to the dual port SRAM cell.
Public/Granted literature
- US20230005936A1 DUAL PORT SRAM CELL AND DESIGN METHOD THEREOF Public/Granted day:2023-01-05
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