Invention Grant
- Patent Title: Production method of wafer
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Application No.: US17232204Application Date: 2021-04-16
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Publication No.: US11890783B2Publication Date: 2024-02-06
- Inventor: Xiaoming Qiu
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: DISCO CORPORATION
- Current Assignee: DISCO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain Ltd.
- Priority: JP 20081276 2020.05.01
- Main IPC: B28D5/00
- IPC: B28D5/00 ; B23K26/53 ; B23K103/00 ; B23K101/40 ; H01L29/16

Abstract:
A production method of a wafer includes a wafer production step in which ultrasonic water is ejected against an end face of an ingot with cleavage layers created therein, thereby severing the wafer from a rest of the ingot to produce the wafer.
Public/Granted literature
- US20210339428A1 PRODUCTION METHOD OF WAFER Public/Granted day:2021-11-04
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