An imprint system includes a replica mold manufacturing apparatus which manufactures a replica mold of a master mold by performing a first imprint process using the master mold, an imprint apparatus which performs a second imprint process using the replica mold, and a controller which controls a first imprint condition that is an imprint condition of the first imprint process and a second imprint condition that is an imprint condition of the second imprint process. The controller corrects the first imprint condition based on an overlay state between a pattern formed on a shot region by the second imprint process and the shot region.