Invention Grant
- Patent Title: Storage container storing treatment liquid for manufacturing semiconductor
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Application No.: US17676235Application Date: 2022-02-21
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Publication No.: US11892775B2Publication Date: 2024-02-06
- Inventor: Tetsuya Shimizu , Tetsuya Kamimura
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: JCIPRNET
- Priority: JP 16073257 2016.03.31 JP 17045864 2017.03.10
- Main IPC: G03F7/32
- IPC: G03F7/32 ; G03F7/30 ; G03F7/16 ; G03F7/40 ; H01L21/027 ; B65D25/14 ; B65D85/00 ; H01L21/308

Abstract:
A storage container storing a treatment liquid for manufacturing a semiconductor is provided, wherein the occurrence of defects on the semiconductor, such as particles, is suppressed and a fine resist pattern or a fine semiconductor element is manufactured. The storage container includes a storage portion that stores the treatment liquid, wherein the treatment liquid includes one kind or two or more kinds of metal atoms selected from Cu, Fe, and Zn, and a total content of particulate metal that is a metal component derived from the metal atoms and that is a nonionic metal component present in the treatment liquid as a solid without being dissolved is 0.01 to 100 mass ppt with respect to a total mass of the treatment liquid.
Public/Granted literature
- US20220179320A1 STORAGE CONTAINER STORING TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR Public/Granted day:2022-06-09
Information query
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