Invention Grant
- Patent Title: Methods for forming charge layers using gas and liquid phase coatings
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Application No.: US17701242Application Date: 2022-03-22
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Publication No.: US11894232B2Publication Date: 2024-02-06
- Inventor: Taichou Papo Chen
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: MOSER TABOADA
- Main IPC: H01L21/223
- IPC: H01L21/223
Abstract:
Methods for adjusting a work function of a structure in a substrate leverage near surface doping. In some embodiments, a method for adjusting a work function of a structure in a substrate may include coating surfaces of the structure to form a doping layer in a non-solid phase that contains dopants on the surfaces of the structure and performing a dopant diffusion process using an oxidation process to drive the dopants through the surfaces the structure to embed the dopants in the structure to adjust the work function of the structure near the surfaces to form an abrupt junction profile and form an oxidation layer on the surfaces of the structure. The coating of the surfaces of the structure may be performed using a gas-phase or liquid-phase process.
Public/Granted literature
- US20230307235A1 METHODS FOR FORMING CHARGE LAYERS USING GAS AND LIQUID PHASE COATINGS Public/Granted day:2023-09-28
Information query
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