- Patent Title: Cleaning member mounting mechanism and substrate cleaning apparatus
-
Application No.: US17336627Application Date: 2021-06-02
-
Publication No.: US11894244B2Publication Date: 2024-02-06
- Inventor: Mitsuru Miyazaki , Tomoaki Fujimoto , Takuya Inoue
- Applicant: EBARA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: EBARA CORPORATION
- Current Assignee: EBARA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: BakerHostetler
- Priority: JP 20097110 2020.06.03
- Main IPC: H01L21/67
- IPC: H01L21/67 ; B08B1/00 ; B08B1/02
Abstract:
A cleaning member mounting mechanism has: a cleaning member holding part, to which a cleaning member assembly having a cleaning member for cleaning a substrate W can be mounted; a member rotation part for rotating the cleaning member assembly held by the cleaning member holding part; and a moving part which moves the cleaning member holding part along an axial direction when the cleaning member assembly is removed, thereby to bring the cleaning member holding part into a rotation fixed position to restrict a rotation of the cleaning member holding part.
Public/Granted literature
- US20210384048A1 CLEANING MEMBER MOUNTING MECHANISM AND SUBSTRATE CLEANING APPARATUS Public/Granted day:2021-12-09
Information query
IPC分类:
