Invention Grant
- Patent Title: GIS-based method for producing spatial wafer map, and method for providing wafer test results using same
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Application No.: US17926185Application Date: 2021-10-06
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Publication No.: US11894278B2Publication Date: 2024-02-06
- Inventor: Bu Young Kim , Sang Heon Lee , Wang Kook Im , Sung Hwan Park
- Applicant: APHROSYS CO.,LTD.
- Applicant Address: KR Anyang-si
- Assignee: APHROSYS CO.,LTD.
- Current Assignee: APHROSYS CO.,LTD.
- Current Assignee Address: KR Anyang-si
- Agency: ANTONIO HA & U.S. PATENT, LLC
- Priority: KR 2020013835 2020.10.14
- International Application: PCT/KR2021/013696 2021.10.06
- International Announcement: WO2022/080740A 2022.04.21
- Date entered country: 2022-11-18
- Main IPC: H01L21/66
- IPC: H01L21/66

Abstract:
Disclosed is a method for producing a wafer map. More specifically, the present invention relates to: a method for producing a wafer map used for manufacturing chips in the semiconductor field, wherein a geographic information system (GIS) technique is used to produce the wafer map; and a method and system for providing wafer test results using same. According to an embodiment of the present invention, a semiconductor wafer is formed as a map by using the GIS technique, a coordinate system used in the GIS is utilized to create a map of the same size as an actual semiconductor wafer, and each of various constituent elements constituting the wafer can be stratified to reflect the actual size of the element to create a wafer map in which each of the elements is geocoded.
Public/Granted literature
- US20230238288A1 GIS-BASED METHOD FOR PRODUCING SPATIAL WAFER MAP, AND METHOD FOR PROVIDING WAFER TEST RESULTS USING SAME Public/Granted day:2023-07-27
Information query
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