Invention Grant
- Patent Title: Extended seal ring structure on wafer-stacking
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Application No.: US17150871Application Date: 2021-01-15
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Publication No.: US11894319B2Publication Date: 2024-02-06
- Inventor: Shih-Hsorng Shen , Kuan-Hsien Lee
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Slater Matsil, LLP
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L23/52 ; H01L29/40 ; H01L23/58 ; H01L23/00 ; H01L21/78 ; H01L25/065 ; H01L25/00

Abstract:
Embodiments include a wafer-on-wafer bonding where each wafer includes a seal ring structure around die areas defined in the wafer. Embodiments provide a further seal ring spanning the interface between the wafers. Embodiments may extend the existing seal rings of the wafers, provide an extended seal ring structure separate from the existing seal rings of the wafers, or combinations thereof.
Public/Granted literature
- US20220037268A1 EXTENDED SEAL RING STRUCTURE ON WAFER-STACKING Public/Granted day:2022-02-03
Information query
IPC分类: