Invention Grant
- Patent Title: Semiconductor device package with stress reduction design and method of forming the same
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Application No.: US17460668Application Date: 2021-08-30
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Publication No.: US11894320B2Publication Date: 2024-02-06
- Inventor: Shu-Shen Yeh , Chin-Hua Wang , Po-Chen Lai , Po-Yao Lin , Shin-Puu Jeng
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L21/52 ; H01L23/16 ; H01L23/053

Abstract:
A semiconductor device package and a method of forming the same are provided. The semiconductor device package includes a substrate, a semiconductor device, a ring structure, a lid structure, and an adhesive member. The semiconductor device is disposed over the substrate. The ring structure is disposed over the substrate and surrounds the semiconductor device. The lid structure is disposed over the ring structure and extends across the semiconductor device. The adhesive member is disposed in a gap between the ring structure and the semiconductor device and attached to the lid structure and the substrate.
Public/Granted literature
- US20230067690A1 SEMICONDUCTOR DEVICE PACKAGE WITH STRESS REDUCTION DESIGN AND METHOD OF FORMING THE SAME Public/Granted day:2023-03-02
Information query
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