Invention Grant
- Patent Title: Methods of manufacturing a semiconductor device including a joint adjacent to a post
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Application No.: US17209113Application Date: 2021-03-22
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Publication No.: US11894330B2Publication Date: 2024-02-06
- Inventor: Chun-Lin Lu , Kai-Chiang Wu , Ming-Kai Liu , Yen-Ping Wang , Shih-Wei Liang , Ching-Feng Yang , Chia-Chun Miao , Hao-Yi Tsai
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT LAW
- Agent Anthony King
- The original application number of the division: US15797623 2017.10.30
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L23/498

Abstract:
A method of manufacturing a semiconductor device includes providing a carrier, disposing a first pad on the carrier, forming a post on the first pad, and disposing a joint adjacent to the post and the first pad to form a first entire contact interface between the first pad and the joint and a second entire contact interface between the first pad and the post. The first entire contact interface and the second entire contact interface are flat surfaces.
Public/Granted literature
- US20210210450A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2021-07-08
Information query
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