Invention Grant
- Patent Title: Manufacturing method of power semiconductor device, power semiconductor device, and power converter
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Application No.: US17359233Application Date: 2021-06-25
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Publication No.: US11894337B2Publication Date: 2024-02-06
- Inventor: Keisuke Kawamoto
- Applicant: Mitsubishi Electric Corporation
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Studebaker & Brackett PC
- Priority: JP 19006510 2019.01.18
- The original application number of the division: US16672126 2019.11.01
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H02M7/5387 ; H02M7/00 ; H02P27/08 ; H01L23/367

Abstract:
A power semiconductor element and a support member are stacked with an intermediate structure being interposed between the power semiconductor element and the support member. The intermediate structure includes a first metal paste layer and at least one first penetrating member. The first metal paste layer contains a plurality of first metal particles. The at least one first penetrating member penetrates the first metal paste layer. At least one first vibrator attached to the at least one first penetrating member penetrating the first metal paste layer is vibrated. The first metal paste layer is heated so that the plurality of first metal particles are sintered or fused.
Public/Granted literature
- US20210320083A1 MANUFACTURING METHOD OF POWER SEMICONDUCTOR DEVICE, POWER SEMICONDUCTOR DEVICE, AND POWER CONVERTER Public/Granted day:2021-10-14
Information query
IPC分类: