- Patent Title: Array substrate, manufacturing method thereof, and display panel
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Application No.: US16963369Application Date: 2020-07-09
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Publication No.: US11894386B2Publication Date: 2024-02-06
- Inventor: Peng Zhang
- Applicant: SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Applicant Address: CN Guangdong
- Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Guangdong
- Agency: PV IP PC
- Agent Wei Te Chung; Zhigang Ma
- Priority: CN 2010534614.3 2020.06.12
- International Application: PCT/CN2020/101098 2020.07.09
- International Announcement: WO2021/248609A 2021.12.16
- Date entered country: 2020-07-20
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L21/48 ; H01L29/417 ; H01L29/786

Abstract:
An array substrate, a manufacturing method thereof, and a display panel are provided. The array substrate includes an active layer, a metal contact layer, a gate insulating layer, a gate layer, a source/drain layer, and a pixel electrode, which are sequentially disposed on a substrate. An insulating area of the metal contact layer corresponds to a channel area of the active layer, and a conductive area of the metal contact layer is disposed at two sides of the insulating area. A source and a drain of the source/drain layer are individually connected to the conductive area. Therefore, a problem of relatively high electrical resistance of a conductorized IGZO area in conventional TFT devices can be solved.
Public/Granted literature
- US20230253410A1 ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF, AND DISPLAY PANEL Public/Granted day:2023-08-10
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