Invention Grant
- Patent Title: Method adapted to manufacture array substrate and display panel
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Application No.: US17974533Application Date: 2022-10-27
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Publication No.: US11894388B2Publication Date: 2024-02-06
- Inventor: Bei Zhou Huang
- Applicant: HKC CORPORATION LIMITED
- Applicant Address: CN Shenzhen
- Assignee: HKC CORPORATION LIMITED
- Current Assignee: HKC CORPORATION LIMITED
- Current Assignee Address: CN Shenzhen
- The original application number of the division: US16313064 2018.12.24
- Main IPC: H01L27/12
- IPC: H01L27/12 ; G02F1/1368
Abstract:
The application discloses a method adapted to manufacture an array substrate and a display panel. The method includes: forming a photoresist layer, a source and a drain; post-baking the photoresist layer, so that the photoresist layer flows to the position of a channel; etching a semiconductor layer to obtain a preset pattern; and peeling off the photoresist layer.
Public/Granted literature
- US20230048505A1 METHOD ADAPTED TO MANUFACTURE ARRAY SUBSTRATE AND DISPLAY PANEL Public/Granted day:2023-02-16
Information query
IPC分类:
