Invention Grant
- Patent Title: Variable resistance memory device
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Application No.: US17496000Application Date: 2021-10-07
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Publication No.: US11895850B2Publication Date: 2024-02-06
- Inventor: Min Chul Han
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Muir Patent Law, PLLC
- Priority: KR 20210032764 2021.03.12
- Main IPC: H10B63/00
- IPC: H10B63/00

Abstract:
A variable resistance memory device includes memory cell structures on a substrate and spaced apart from each other in first and second directions, the first and second directions being parallel to a top surface of the substrate and intersecting each other, and a dummy cell structure surrounding each of the memory cell structures, as viewed in a plan view, the dummy cell structure being a single body structure extending continuously between all the memory cell structures, wherein each of the memory cell structures includes first conductive line on and intersecting second conductive lines, and memory cells between the first and second conductive lines, and wherein the dummy cell structure includes first dummy conductive lines on and intersecting second dummy conductive lines, and dummy memory cells between the first and second dummy conductive lines.
Public/Granted literature
- US20220293680A1 VARIABLE RESISTANCE MEMORY DEVICE Public/Granted day:2022-09-15
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